Serveur d'exploration sur le thulium

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Tunable laser operation of a Tm3+-doped tellurite glass laser near 2 μm pumped by a 1211 nm semiconductor disk laser

Identifieur interne : 000D80 ( Main/Exploration ); précédent : 000D79; suivant : 000D81

Tunable laser operation of a Tm3+-doped tellurite glass laser near 2 μm pumped by a 1211 nm semiconductor disk laser

Auteurs : F. Fusari [Royaume-Uni] ; S. Vetter [Royaume-Uni] ; A. A. Lagatsky [Royaume-Uni] ; B. Richards [Royaume-Uni] ; S. Calvez [Royaume-Uni] ; A. Jha [Royaume-Uni] ; M. D. Dawson [Royaume-Uni] ; W. Sibbett [Royaume-Uni] ; C. T. A. Brown [Royaume-Uni]

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RBID : Pascal:10-0340180

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Abstract

We report on the performance around 1970 nm of a thulium-doped TZNG bulk glass laser pumped by a semiconductor disk laser (SDL) emitting at 1211 nm. A pump-limited maximum output power of 60 mW at 1946 nm was obtained with a measured slope efficiency of 22.4%. The tuning range of 115 nm extended from 1850 nm to 2040 nm. Comparison with a previously reported performance when pumped at 793 nm with Ti:sapphire laser is discussed highlighting the competitiveness of pumping at 1211 nm.


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Le document en format XML

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<term>Optical materials</term>
<term>Output power</term>
<term>Rare earths</term>
<term>Semiconductor lasers</term>
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<term>Pompage par laser</term>
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<term>Puissance sortie</term>
<term>Matériau optique</term>
<term>Matériau dopé</term>
<term>Matériau laser</term>
<term>Tellurite</term>
<term>Verre</term>
<term>Addition thulium</term>
<term>Lanthanide</term>
<term>Laser Ti:saphir</term>
<term>4270H</term>
<term>4255P</term>
<term>4255R</term>
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<term>Verre</term>
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<front>
<div type="abstract" xml:lang="en">We report on the performance around 1970 nm of a thulium-doped TZNG bulk glass laser pumped by a semiconductor disk laser (SDL) emitting at 1211 nm. A pump-limited maximum output power of 60 mW at 1946 nm was obtained with a measured slope efficiency of 22.4%. The tuning range of 115 nm extended from 1850 nm to 2040 nm. Comparison with a previously reported performance when pumped at 793 nm with Ti:sapphire laser is discussed highlighting the competitiveness of pumping at 1211 nm.</div>
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